Publications
Number 1, February 2017, pp. 45-49 (peer reviewed) R. Wang, P. R. Whelan, P. Braeuninger-Weimer, S. Tappertzhofen , J. A. Alexander-Webber, Z. A. Van Veldhoven, P. R. Kidambi, B. S. Jessen, T. Booth, P. Bøggild [...] Semiconductor Processes and Devices (SISPAD), 24.09.2025-26.9.2025, Grenoble, France, 2025 P. Kolesnik , N. Kolks , P. Czyba , S. Tappertzhofen: A novel approach for the manufacturing of stoichiometric Ni [...] 2025, Lodz, Poland, 2025 P. Sarapukdee, C. Spenner, D. Schulz and S. Palzer: Simulation Environment for Optimized Grating-Based Plasmon Couplers , Eurosensors 2025, 2025 V. Ganiu, P. Lösing, M. Jäger, D. …